3d stacked-chip package

ABSTRACT

Disclosed herein is a package comprising a first die having a first redistribution layer (RDL) disposed on a first side of a first substrate and a second die having a second RDL disposed on a first side of a second substrate, with the first RDL bonded to the second RDL. A third die having a third RDL is disposed on a first side of a third substrate, the third die mounted over the second die, with the second die disposed between the first die and the third die. First vias extend through, and are electrically isolated from, the second substrate, with the first vias each contacting a conductive element in the first RDL or the second RDL. Second vias extend through, and are electrically isolated from, the third substrate, with the second vias each contacting a conductive element in the third RDL or one of the first vias.

PRIORITY CLAIM AND CROSS-REFERENCE

This application is a divisional of U.S. application Ser. No.14/462,791, filed Aug. 19, 2014, which claims the benefit of U.S.Provisional Application No. 61/986,653, filed on Apr. 30, 2014, titled“3D Chip-on-Wafer-on-Substrate,” which application is herebyincorporated by reference.

BACKGROUND

The semiconductor industry has experienced rapid growth due tocontinuous improvements in the integration density of a variety ofelectronic components (e.g., transistors, diodes, resistors, capacitors,etc.). For the most part, this improvement in integration density hascome from repeated reductions in minimum feature size (e.g., shrinkingthe semiconductor process node towards the sub-20 nm node), which allowsmore components to be integrated into a given area. As the demand forminiaturization, higher speed and greater bandwidth, as well as lowerpower consumption and latency has grown recently, there has grown a needfor smaller and more creative packaging techniques of semiconductordies.

As semiconductor technologies further advance, stacked semiconductordevices, e.g., 3D integrated circuits (3DIC), have emerged as aneffective alternative to further reduce the physical size of asemiconductor device. In a stacked semiconductor device, active circuitssuch as logic, memory, processor circuits and the like are fabricated ondifferent semiconductor wafers. Two or more semiconductor wafers may beinstalled on top of one another to further reduce the form factor of thesemiconductor device.

Two semiconductor wafers or dies may be bonded together through suitablebonding techniques. The commonly used bonding techniques include directbonding, chemically activated bonding, plasma activated bonding, anodicbonding, eutectic bonding, glass frit bonding, adhesive bonding,thermo-compressive bonding, reactive bonding and/or the like. Anelectrical connection may be provided between the stacked semiconductorwafers. The stacked semiconductor devices may provide a higher densitywith smaller form factors and allow for increased performance and lowerpower consumption.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1-15 illustrate cross-sectional views of intermediate processingsteps in forming a chip-on-wafer structure using a via last processaccording to an embodiment;

FIGS. 16-20 illustrate cross-sectional views of intermediate processingsteps in forming a chip-on-wafer structure using via last processaccording to another embodiment;

FIGS. 21-29 illustrate cross-sectional views of intermediate processingsteps in forming a chip-on-wafer structure using a dual damascene vialast process according to an embodiment; and

FIGS. 30-35 illustrate cross-sectional views of intermediate processingsteps in forming a 3D chip-on-wafer-on-substrate structure according tosome embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

Semiconductor devices are bonded together to form packages with variouscapabilities. In some processes, dies, wafers or a combination of diesand wafers, are bonded together using direct surface bonding such asoxide-to-oxide bonding, through hybrid bonding, or the like. It has beendiscovered that interconnections between bonded wafers can be providedusing a via last process. In the via last process, the vias are formedthrough one of the dies after the dies have been bonded to provideelectrical connection between the dies and external connectors using aself-aligning insulating spacer on the sidewalls of the via openings.The self-aligning spacer on the sidewalls permits narrower, taller vias,and improves the aspect ratio of the vias to between about 3 and about10. The improved aspect ratio results in more compactly arranged viaarrays.

It has further been discovered that the via last process permitsstacking of numerous dies, as connectivity between dies in a package, orbetween dies and external connectors can be provided by embodiments ofthe via last processes disclosed herein. Vias are formed after bondingeach die or layer of dies. Vias are formed to connect to a previouslybonded die, or to a previously formed via in a lower die. Externalconnectors are provided over the top or layer die, with the externalconnectors connecting the vias to a power source or providingcommunication with another die, substrate, package, or the like.

FIG. 1 illustrates a cross-sectional view of a wafer 104 and die 102prior to bonding according to an embodiment. A die 102 comprises a diesubstrate 106 such as a semiconductor having one or more active devicesformed therein. A die redistribution layer (RDL) 108 is disposed on thedie substrate 106. The die RDL 108 comprises one or more dielectriclayers with conductive elements 110 disposed in the dielectric layers.The die RDL 108 is formed over the side of the substrate having theactive devices, with the conductive elements 110 connecting to theactive devices on the die substrate 106.

The wafer 104 has a wafer RDL 114 disposed over a wafer substrate 112.In some embodiments, the wafer substrate 112 is a semiconductor with oneor more active devices formed therein. The wafer RDL 114 is formed overthe active devices in the wafer substrate 112 and has one or moreconductive elements 110 disposed in dielectric layers.

FIG. 2 illustrates a cross-sectional view of a processing step forbonding a wafer according to an embodiment. The die 102 and wafer 104are bonded at the top surfaces of the RDLs 108 and 114, forming a bondinterface 202. The die 102 and wafer 104 are used as the basis for apackage having connections for mounting the package to external devices,substrates, or the like. In some embodiments, the die 102 is bonded tothe wafer 104 by, for example, direct surface bonding, metal-to-metalbonding, hybrid bonding, or another bonding process. A direct surfacebonding process creates an oxide-to-oxide bond or substrate-to-substratebond through a cleaning and/or surface activation process followed byapplying pressure, heat and/or other bonding process steps to the joinedsurfaces. In some embodiments, the die 102 and wafer 104 are bonded bymetal-to-metal bonding that is achieved by fusing conductive elements110, such as metal bond pads, exposed at the surfaces of the RDLs 108and 114. In other embodiments, hybrid bonding is used to bond the die102 and wafer 104 by a combination of direct surface bonding andmetal-to-metal bonding, where both the surfaces of the RDLs 108 and 114and the surfaces of metal bond pads exposed at the surfaces of the RDLs108 and 114 are bonded. In some embodiments, the bonded dies are baked,annealed, pressed, or otherwise treated to strengthen or finalize thebond.

FIG. 3 is a cross-sectional view of forming molding compound 302 overthe package according to an embodiment. The molding compound 302 isformed around the die 102 and on the wafer RDL 114. In some embodiments,the molding compound 302 is shaped or molded using for example, a mold(not shown) which may have a border or other feature for retainingmolding compound 302 when applied. Such a mold may be used to pressuremold the molding compound 302 around the die 102 to force the moldingcompound 302 into openings and recesses, eliminating air pockets or thelike in the molding compound 302. In an embodiment, the molding compound302 is a nonconductive or dielectric material, such as an epoxy, aresin, a moldable polymer such as PBO, or another moldable material. Forexample, molding compound 302 is an epoxy or resin that is cured througha chemical reaction or by drying. In another embodiment, the moldingcompound 302 is an ultraviolet (UV) cured polymer.

After the molding compound 302 is formed over the die 102 and wafer 104,the molding compound 302 is reduced or planarized by, for example,grinding, a chemical-mechanical polish (CMP), etching or anotherprocess. In some embodiments, the molding compound 302 extends over thedie 102 after planarization, and in other embodiments, the moldingcompound is reduced so that the die 102 is exposed. The die substrate106 is, in some embodiment, thinned or reduced in the same process asthe molding compound, resulting in a die 102 backside surface that issubstantially planar with the molding compound surface.

FIG. 4 is a cross-sectional view of mounting the package to a carrier402 according to an embodiment. The package is inverted to permit accessto, and processing through the wafer substrate 112. The die 102 andmolding compound 302 surface are bonded to, for example, a glasscarrier, or other handling substrate. The package is attached to thecarrier 402 using die attachment film (DAF), an adhesive, or the like.In other embodiments, the package is attached to the carrier 402 withthe wafer substrate 112 on the carrier 402, permitting processing of thepackage through the die side of the package. In some embodiments, thewafer substrate 112 is also thinned or reduced by grinding, CMP, etchingor another process.

FIG. 5 is a cross-sectional view illustrating masking the wafersubstrate 112 according to an embodiment. An etch stop layer 502 isformed on the wafer substrate 112, and is formed from a material thathas a high etch selectivity compared to the material of the wafersubstrate 112. Additionally, the etch stop layer 502 has a high etchselectivity compared to the wafer RDL 114 and die RDL 108. In someembodiments where the wafer substrate 112 is, for example, silicon andthe RDLs 114 and 108 are silicon oxide, the etch stop layer 502 is anitride such as silicon nitride (SiN), a carbide such as silicon carbide(SiC) or an oxynitride such as silicon oxynitride (SiON), or anotheretch stop material. In such an embodiment, the etch stop layer isdeposited by deposited using chemical vapor deposition (CVD), plasmaenhanced CVD (PECVD), physical vapor deposition (PVD), epitaxy, aspin-on process, or another deposition process.

A mask 504 is formed over the etch stop layer 502 and is patterned toform openings 506 exposing portions of the etch stop layer 502. The mask504 is, in some embodiments, a photoresist that is deposited, exposedand developed. The openings 506 in the mask 504 are aligned overconductive elements 110 in the RDLs 108 and 114.

FIG. 6 is a cross-sectional view illustrating etching of the etch stoplayer 502 according to an embodiment. The etch stop layer 502 is etchedto expose the wafer substrate 112. In some embodiment, the etch stoplayer 502 is etched with a dry plasma etch, such as an oxygen ornitrogen plasma with a fluorine based etchant such as carbontetrafluoride (CF₄) or sulfur hexafluoride (SF₆). In other embodiments,the etch stop layer 502 is etched by a wet etch; using for example,sulfuric acid (H₂SO₄) heated phosphoric acid (H₃PO₄), or the like.

FIG. 7 is a cross-sectional view illustrating etching of the wafersubstrate 112 according to an embodiment. The wafer substrate 112 isetched anisotropically to form via openings 702 with substantiallyvertical walls. In some embodiments, the wafer substrate 112 is etchedin a separate process step from etching the etch stop layer 502,permitting the etch stop layer 502 to act as a hard mask for etching thewafer substrate 112. For example, where the wafer substrate 112 issilicon, the wafer substrate 112 is dry plasma etched with a chlorinebased etchant, such as gaseous chlorine (Cl₂) or wet etched withpotassium hydroxide (KOH) or a nitric acid/hydrofluoric acid (HNO₃/HF)mix. Additionally, the wafer substrate 112 is selectively etched, withthe etch stopping at the wafer RDL 114.

FIG. 8 is a cross-sectional view illustrating etching of the oxidelayers of the RDLs 108 and 114. The oxide layers are, in an embodiment,etched using a buffered oxide etch (BOE) comprising ammonium fluoride(NH₄F) and hydrofluoric acid. Conductive elements 110 in the oxidelayers of the RDLs 108 and 114 act as an etch stop layer, permittingetching of the RDLs 108 and 114 to different depths. Etching the oxidelayers extends the via openings 702 to conductive elements 110 in theRDLs 108 and 114. In some embodiments, a via opening 702 extends throughan opening in an upper conductive element 110 and exposes a surface of alower conductive element 110. Thus, a single via opening 702 can exposesurfaces of multiple conductive elements 110. Additionally, in someembodiment, the via openings 702 expose conductive elements 110 in thedie RDL 108 and the wafer RDL 114.

FIG. 9 is a cross-sectional view illustrating formation of an isolationlayer 902 according to an embodiment. The mask 504 (see FIG. 7) isremoved, and a conformal dielectric isolation layer 902 is formed overthe etch stop layer 502. The isolation layer 902 extends into each ofthe via openings 702 and covers the sidewalls of the via openings 702,including the portions of the wafer substrate 112 exposed in the viaopenings 702.

In an embodiment, the isolation layer 902 is formed from siliconnitride, for example, using a CVD or PECVD process. In otherembodiments, the isolation layer 902 is formed from an oxide, anothernitride, a carbide, an oxynitride, spin on glass (SOG) or anotherdielectric or electrical insulating material. The thickness of theisolation layer 902 is determined, in part, by the intended voltage onvias that will be formed in the via openings 702. It has been determinedthat a thickness between about 500 angstroms and about 5000 angstromswill provide a thickness that results in a breakdown voltage that isgreater than about 3.8 volts.

FIG. 10 is a cross-sectional view illustrating formation ofself-aligning spacers 1002 according to an embodiment. The isolationlayer 902 (see FIG. 9) is etched, using for example, a dry plasma etchwith chlorine, sulfur hexafluoride, carbon tetrafluoride, chlorine oranother etchant in an argon (Ar), helium (He) or other environment. Insome embodiments, the etchant is provided with, for example, oxygen(O₂), nitrogen (N₂) or other process gasses to increase the selectivityof the etch. In such an etch, the environment is maintained betweenabout 25° C. and about 150° C. at a pressure between about 10 mtorr andabout 200 mtorr. In some embodiments, the etch is anisotropic, removingmaterial in a vertical direction. Thus, the etch removes material of theisolation layer 902 from the horizontal surfaces of the package, leavingspacers 1002 on the sidewall surfaces of the package. For example,portions of the isolation layer 902 disposed on the etch stop layer 502are removed while portions of the isolation layer 902 disposed on thesidewalls of the via openings 702 remain. This is due to the thicknessof the isolation layer 902 in the vertical direction being greater whereat the sidewalls than at the horizontal surfaces. Additionally, theportions of the top surfaces of the conductive elements 110 are exposedduring the etch. This is due to the isolation material being removedsubstantially from the top direction, as the directional etching of theisolation layer 902 reduces the top surface of the isolation layer 902,eliminating the lateral portions of the isolation layer 902 and leavingthe vertical portions.

It has been discovered that self-aligning spacers 1002 can be formedwithin the via openings 702, and that the self-aligning feature of thespacers 1002 causes the spacers 1002 to form on the sidewalls of the viaopenings 702. The spacers 1002 insulate the material forming thesidewalls of the via openings 702 from vias formed in the via openings702. In particular, the spacers 1002 form on the sidewalls of the viaopenings 702 where the via opening 702 passes through the wafersubstrate 112, with the outer surfaces of the spacers 1002 disposed onthe sidewalls of the via openings 702, and with the inner surfaces ofthe spacers 1002 facing the interior of the via openings 702. Thespacers 1002 permit a conductive via to be formed in the via opening 702while avoiding electrical contact with the vertical surfaces of thewafer substrate 112 and RDLs 108 and 114. In some embodiments, thespacers 1002 extend to an underlying conductive feature 110, shieldingthe via opening 702 from all of the sidewalls of the via openings 702.Additionally, the spacers 1002 leave portions of the lateral surfaces ofthe conductive elements 110 exposed in the via openings 702 so that asubsequently formed via can come into electrical contact with theconductive elements 110. Thus, some of the spacers extend below thebottommost surface of the wafer substrate 112 into the RDLs 108 and 114,with the inner surfaces of the spacers 1002 extending contiguously fromthe conductive element 1002 to the top surface of the wafer substrate112, or over the top surface of the wafer substrate.

In some embodiments where a via opening 702 is formed over or through anupper conductive element 110 to a lower conductive element 110, the viaopening 702 has an upper portion with a wider width than a lower portionof the via opening 702. In such an embodiment, separate spacers 1002 areformed on the sidewalls of the upper and lower portions of the viaopenings 702, with the upper and lower spacer 1002 laterally spacedapart to expose the lateral surfaces of the upper conductive element110.

FIG. 11 is a cross-sectional view illustrating formation of vias 1102 inthe via openings 702 according to an embodiment. As the vias 1102 areformed after bonding the die 102 to the wafer 104, this process isreferred to as a via last process. In some embodiments, vias 1102 thatextend through a substrate such as the wafer substrate 112 are referredto as through substrate vias (TSVs) or alternatively, as through siliconvias for vias extending through a silicon substrate. Vias 1102 thatextend through the molding compound 302 are referred to as throughdielectric vias (TDVs).

In some embodiments, a barrier layer (not shown for clarity) is formedin the via openings 702, with the barrier layer formed from, forexample, cobalt (Co), tantalum, tungsten, tantalum nitride (TaN),titanium nitride (TiN), or the like by CVD, PECVD or another depositionprocess. Vias 1102 are created by filling the via openings 702 with aconductive material such as copper (Cu) aluminum (Al), aluminum copperalloy (AlCu), gold, titanium, cobalt, an alloy, or another conductivematerial. In some embodiments, the vias are formed through, for example,electrochemical plating (ECP), electroplating, electroless plating oranother process. In such embodiments, a seed layer (not shown) is formedover the barrier layer or over the spacers and conductive elements 110by for example, atomic layer deposition. The seed layer providesnucleation sites for the plating process and increases the uniformity ofthe plated material that forms the vias 1102. In some embodiments, theconductive material of the vias 1102 extends over the via openings 702.Such overfilling is used, for example, to ensure that the openings 702are completely filled. Excess material is removed by grinding, CMP,polishing, etching or another reduction process. After formation of thevias 1102, the top surfaces of the vias 1102 are substantially planarwith the top surface of the etch stop layer 502. In some embodiments,the grinding process removes the etch stop layer 502 or reduces the topsurface of the wafer substrate 112.

The vias 1102 extend through the wafer substrate 112 to contact one ormore conductive elements 110. The spacers 1002 electrically insulate thevias 1102 from the wafer substrate 112 so that electrical signals sentthrough the vias 1102 do not interfere with active devices in the wafersubstrate 112. In some embodiments, a via 1102 extends through the wafersubstrate 112, the wafer RDL 114, and bond interface 202 to contact aconductive element 110 in the die RDL 108. In such an embodiment, theconductive element 110 on the die RDL 108 is electrically connected tothe die substrate 106 through the die RDL 108. Thus, a connectionbetween the die substrate 106 and an external device or connection maybe formed from the wafer side of the package. Similarly, in someembodiments, a via 1102 extends through the wafer substrate 112 andcontacts a conductive element 110 in the wafer RDL 114 that iselectrically connected to the wafer substrate 112. Thus, power or dataconnections can be provided from the die 102 or wafer 104 through thewafer substrate 112 to an external device.

Additionally, in some embodiments, the wafer 104 can be electricallyconnected to the die 102 using the via last process. For example, afirst conductive element 110 in the wafer RDL 114 and a secondconductive element 110 in the die RDL 108 can be connected by a via 1102that contacts both the first and second conductive elements 110. Thus,even though the RDLs 108 and 114 are between the die 102 and wafer 104,external electrical connectivity and die-to-wafer connectivity can beprovided without discrete connectors such as microbumps or solder ballsformed prior to bonding the die 102 to the wafer 104. Additionally, thevia last process eliminates the requirements for aligning the wafer tothe die during the die-to-wafer bonding process.

It has been discovered that the spacers 1002 provide a lower cost andsimpler structure for chip-on-wafer structures. Additionally, thespacers 1002 permit a height-to-width aspect ratio for the vias that isbetween 3 and about 10, increasing the density of inter-chipconnections. It has been further discovered that, with the vias 1102extending through the wafer substrate 112, the vias 1102 can be arrangedthrough the package more regularly and provide a more heterogeneous chipstack. The regular arrangement of the vias 1102 also provides improvedwarpage control during subsequent processing or package mounting.

FIG. 12 is a cross-sectional view illustrating a top RDL insulatinglayer 1202. In some embodiments, an insulating material such as PBO,silicon oxide, polyimide, or another insulating material is formed overthe etch stop layer 502. One or more RDL openings 1204 are formed in theinsulating layer 1202 exposing the vias 1102. In some embodiment,insulating layer 1202 is PBO that is sprayed on or spun on, and the RDLopenings 1204 are formed by exposing and developing the PBO with aphotolithographic process. In other embodiments, the insulating layer1202 is deposited by CVD or the like and etched, laser drilled, milled,or otherwise patterned.

FIG. 13 is a cross-sectional view illustrating formation of top RDLconductive elements 1302 in the top RDL insulating layer 1202 accordingto an embodiment. A conductive material, such as copper, is depositedover the insulating layer 1202 in the RDL openings 1204 through, forexample, sputtering, PVD, CVD, plating or another deposition process.The deposited conductive material is patterned by masking and etching orby masking prior to deposition. While the illustrated top RDL conductiveelements 1302 are shown extending substantially vertically for clarity,it should be understood that in some embodiments, the top RDL conductiveelements 1302 have portions that extend laterally to provide a desiredlayout for subsequently formed layers or connectors.

FIG. 14 is a cross-sectional view illustrating formation of additionalinsulating layers and conductive elements to form the top RDL 1406. Oneor more top RDL insulating layers 1202 with conductive elements 1302 areformed in a stack to provide electrical connectivity between externaldevices and the vias 1102. Additionally, a protective layer 1402 isformed over the uppermost top RDL insulating layer 1202 and has openingsexposing the top RDL conductive elements 1302. In some embodiments, theprotective layer 1402 is PBO, an epoxy, an oxide, a nitride, a carbide,an oxynitride, a polyimide, or another insulating or protective materialand is deposited and patterned as described above.

FIG. 15 is a cross-sectional view illustrating formation of connectors1502 according to an embodiment. One or more connectors 1502 are mountedon exposed portions of the top RDL conductive elements 1302. In someembodiments, the connectors 1502 are solder balls, pillars, conductivebumps or another conductive connector. The connectors 1502 areconfigured to permit mounting of the package to a target substrate suchas a die, package, wafer, PCB or the like. Thus, the wafer 104 and die102 would be in signal connectivity with the target substrate throughthe connectors 1502 and vias 1102. The carrier 402 then removed from thepackage.

While the chip-on-wafer package is shown using the via last process toform vias 1102 that extend from the wafer side of the package throughthe wafer substrate 112 to the RDLs 108 and 114, it should be understoodthat the disclosed embodiments are not limited to such an arrangement.In other embodiments, vias 1102 are formed from the die side of thepackage through the die substrate 106 and molding compound 302 to theRDLs 108 and 114. Additionally, in some embodiments, the vias 1102 areformed from both the wafer side and die side of the package.

Additionally, the embodiments disclosed above are not limited to theorder of steps and structure described above. FIGS. 16 through 20illustrate cross-sectional views of intermediate processing steps informing a chip-on-wafer structure having partial height self-aligningspacers according to an embodiment.

FIG. 16 illustrates a cross-sectional view of masking and etching viaopenings 1618 in a molding compound 1622 of a package according to anembodiment. A die 1602 and wafer 1604 are bonded, for example, asdescribed above. The die 1602 and wafer 1604 have a die substrate 1612and wafer substrate 1620, respectively, and the substrates 1612 and 1620have one or more active devices. A die RDL 1614 and wafer RDL 1616 aredisposed on the respective substrates 1612 and 1620 and comprisedielectric layers with conductive elements 1610 disposed therein, someof which are in contact with the active devices in the respectivesubstrates 1612 and 1620. The die 1602 and wafer 1604 are bondedtogether so that the die RDL 1614 and wafer RDL 1616 are in contact andform a bond interface 1628. In some embodiments, the die 1602 and wafer1604 are bonded with a direct surface, metal-to-metal or hybrid bond asdescribed above. The molding compound 1622 is formed over the die 1602,and in some embodiments, extends over the die 1602. An etch stop layer1606 is formed over the molding compound 1622.

A mask 1608 is deposited over the etch stop layer 1606 and patternedwith openings disposed over one or more of the conductive elements 1610.Via openings 1618 are etched through the molding compound 1622 using themask 1608 to control the location of the via openings 1618. In anembodiment, the via openings 1618 extend through the molding compound1622, and via openings 1618 disposed over the die substrate 1612 extendthrough the die substrate 1612 to the die RDL 1614. The via openings1618 that are adjacent to, and not disposed over, the die substrate 1612extend partially through the molding compound 1622.

FIG. 17 is a cross-sectional view illustrating formation of an isolationlayer 1702 according to an embodiment. The mask 1608 (see FIG. 16) isremoved, and a conformal dielectric isolation layer 1702 is formed overthe etch stop layer 1606. In an embodiment, the isolation layer 1702 isformed as described above. The isolation layer 1702 extends into each ofthe via openings 1618 and covers the sidewalls of the via openings 1618,including the portions of the die substrate 1612 exposed in the viaopenings 1618. Additionally, the isolation layer 1702 covers the lateralsurfaces of, for example, the die RDL 1614 and the molding compound 1622that are exposed at the bottoms of the openings 1618.

FIG. 18 is a cross-sectional view illustrating formation of partialheight self-aligning spacers 1802 according to an embodiment. Theisolation layer 1702 (see FIG. 17) is etched, in some embodiments, asdescribed above. The etch exposes portions of the lateral surfaces ofthe die RDL 1614 in the via openings 1618 between the spacers 1802.Additionally, for the via openings 1618 that are adjacent to, and notdisposed over, the die RDL 1616, the etch exposes the molding compound1622 surface that forms the bottom of the via openings 1618.

FIG. 19 illustrates a cross-sectional view of a second etch afterformation of the spacers 1802 according to an embodiment. In someembodiments, the isolation layer 1702 a selectively etched as describedabove with respect to FIG. 8. The via openings 1618 are extended tounderlying conductive elements 1610 in the RDLs 1614 and 1616, exposingan upper surface of the conductive elements 1610. In such an embodiment,the spacers 1802 extend only partially through the via openings 1618,with bottom surfaces of the spacers 1802 disposed on the die RDL 1614 orwithin the molding compound 1622. However, the spacers 1802 are disposedin the via openings 1618 on the sidewalls of the die substrate 1612,electrically insulating the die substrate 1612 from the via openings1618 and subsequently formed vias. It has been discovered that thepartial height self-aligning spacers 1802 permit etching of both the dieRDL and the RDLs 1614 and 1616 with a single mask. The spacers 1802 maskthe sidewalls of the die RDL 1614 during the second etch. The resultingvia openings 1618 have a lower portion with sidewalls that aresubstantially planar, level, even or aligned with the inner surfaces ofthe spacers 1802. In some embodiments where the molding compound 1622extends over the top surface of the die substrate 1012, the spacers 1802extend from about the bottom surface of the die substrate 1612 to, orabove, the top surface of the molding compound 1622.

FIG. 20 illustrates a cross-sectional view of formation of the vias 2002according to an embodiment. In some embodiments, vias 2002 are formed inthe via openings 1618 (see FIG. 17) as describe above with respect toFIG. 11. The vias 2002 are insulated from the die substrate 1612 by thespacers 1802, and extend from the top surface of the package through thedie substrate 1612 to conductive elements 1610 in the RDLs 1614 and1616.

While the described embodiments is illustrated as having a partialheight spacer 1802 insulating the vias 2002 from the die substrate 1612,the embodiments are not limited to those described. For example, in someembodiments, the partial height spacers 1802 are disposed in the wafersubstrate 1620, with the vias 2002 extending to the RDLs 1614 and 1616from the wafer side of the package.

FIGS. 21 through 29 illustrate cross-sectional views of intermediateprocessing steps in forming a chip-on-wafer structure using a dualdamascene via last process according to an embodiment. FIG. 21illustrates a cross-sectional view of formation of a molding compound2116 over a die 2102 bonded to a wafer 2104 according to an embodiment.The die 2102 and wafer 2104 have, respectively, a die substrate 2106 andwafer substrate 2112 having one or more active devices. A die RDL 2108and wafer RDL 2114 are disposed on the respective substrates 2106 and2112 and comprise dielectric layers with conductive elements 2110disposed therein, some of which are in contact with the active devicesin the respective substrates 2106 and 2112. The die 2102 and wafer 2104are bonded as described above so that the die RDL 2108 and wafer RDL2114 are in contact and form a bond interface 2118. The molding compound2116 is formed over the die 2102 and wafer 2104 as described above, andin some embodiments, extends over the die 2102.

FIG. 22 illustrates a cross-sectional view of forming a first mask 2202on the package according to an embodiment. In such an embodiment, thefirst mask 2202 is formed over the molding compound 2116 and ispatterned to form openings 2204. The first mask 2202 is, in someembodiments, a photoresist that is deposited, exposed and developed. Theopenings 2204 in the first mask 2202 are aligned over conductiveelements 2110 in the RDLs 2108 and 2114. It has been discovered that adual damascene technique for forming via openings permits theelimination of an etch stop layer and associated etch of the etch stoplayer. In such an embodiment, the first mask 2202 is disposed on themolding compound 2116.

FIG. 23 illustrates a cross-sectional view of etching the die substrate2106 according to an embodiment. Via openings 2302 are formed throughthe molding compound 2116, and through the die substrate 2106 to exposethe die RDL 2108. In an embodiment, the via openings 2302 are etched asdescribed above. Via openings 2302 that are adjacent to, and notdisposed over, the die substrate 2106 extend partially through themolding compound 2116.

FIG. 24 illustrates a cross-sectional view of application of a secondmask 2402 according to an embodiment. In some embodiments, after thefirst etch of the via openings 2302 through the die substrate 2106, thefirst mask 2202 is removed. A second mask 2402 is formed over thesubstrate extends into the via openings 2302. In some embodiments, thesecond mask 2402 is a photoresist deposited, by for example, spincoating, spray coating, or the like.

FIG. 25 illustrates a cross-sectional view of patterning the second mask2402 according to an embodiment. In some embodiments, the second mask2402 is exposed and developed to pattern the second mask 2402 withsecond mask openings 2502. In some embodiments, the second mask openings2502 are wider than the via openings 2302 after the first etch, with thesecond mask openings 2502 disposed over the via openings 2302.Additionally, in some embodiments, the second mask openings 2502 defineopenings for metal lines that extend laterally from the via openings toprovide electrical connectivity to vias subsequently formed in lowerportions of the via openings 2302.

FIG. 26 illustrates a cross-sectional view of etching the RDLs 2108 and2114 according to an embodiment. The RDLs 2108 and 2114 are etched andthe second mask 2402 is removed. In some embodiments, a time mode etchprocess is used so that the etching process etches a predetermineddepth. Etching with the second mask results in upper portions of the viaopenings 2302 having a width wider than the lower portions of the viaopenings 2302. The time mode etch controls the depth of the upperportions of the via openings 2302, and results in the lower portions ofthe via openings 2302 being extended downward to expose the underlyingconductive elements 2110.

FIG. 27 is a cross-sectional view illustrating formation of an isolationlayer 2702 according to an embodiment. A conformal dielectric isolationlayer 2702 is formed over the molding compound 2116 and extends into thevia openings 2302. In an embodiment, the isolation layer 2702 is formedas described above. The isolation layer 2702 extends into each of thevia openings 2308 and covers the sidewalls of the via openings 2308,including the portions of the die substrate 2106 exposed in the viaopenings 2302.

FIG. 28 is a cross-sectional view illustrating formation ofself-aligning spacers 2802 according to an embodiment. In someembodiments, the isolation layer 2702 (see FIG. 27) is etched asdescribed above, removing the lateral portions of the isolation layer2702 and leaving the spacers 2802 on the sidewalls of the via openings2302. The spacers 2802 insulate the die substrate 2106 from the viaopenings 2302 and expose portions of the top surfaces of the conductiveelements 2110. In some dual damascene embodiments, separate spacers 2802are formed in the upper and lower portions of the via openings 2302,with the upper and lower spacers 2802 laterally separated from eachother and exposing a lateral surface of the molding compound 2116.Additionally, the lower spacers 2802 extend from conductive elements2110 in the RDLs 2108 and 2114 above the die substrate 2106 into themolding compound 2116.

FIG. 29 is a cross-sectional view illustrating formation of vias 2902 inthe via openings 702 according to an embodiment. In some embodiments,the vias 2902 are formed as described above. The vias 2902 are insulatedfrom the die substrate 2106 by the spacers 2802 and extend from the topsurface of the molding compound 2116 to the conductive elements 2110. Insome embodiments, the top portions of the vias 2902 extend laterallythrough the top portion of the molding compound 2116, forming a firstlayer for a top RDL in the molding compound 2116. Forming the spacers2802 after the second etch permits the spacers to be formed full heightwithin the via openings 2302. In some embodiments, a barrier layer, seedlayer and metal layer are formed in the via openings 2302, and thenreduced by CMP or the like. Thus, discrete steps form forming theconductive elements of the first layer of the top RDL can beconsolidated into the via formation process, reducing costs andincreasing throughput.

FIGS. 30 through 35 illustrate cross-sectional views of intermediateprocessing steps in forming a chip-on-wafer structure with multiple setsof vias formed through the via last process, permitting three or moredies to be stacked in a 3D Chip-on-wafer-on-substrate package. It hasbeen discovered that the via last process can be used to provideinter-chip connectivity for stacked dies with a pitch that is 10 μm ofless, and provide the improved pitch without solder balls or microbumpsbetween the stacked chips. Additionally, the via last process permitsdies to be directly bonded without requiring that metal pads in bondedRDLs be in contact during the bonding process. The via last processfurther permits dies of different widths to be stacked withoutadditional process steps, as the via last process can form vias throughmolding compound in the same process steps as vias through the stackeddies, and permits the use of fan-out via layouts.

FIG. 30 illustrates a cross-sectional view of an initial step in forminga package 3000 with multiple layers of vias according to an embodiment.Initially, a first die 3002 is provided. One or more second dies 3008are mounted on the first die 3002. The first die 3002 has a firstsubstrate 3004 with a first RDL 3006, and the second dies 3008 each havea second substrate 3010 and a second RDL 3012. Conductive elements 3014are disposed in the RDLs 3006 and 3012, and are electrically connectedto the respective substrates 3004 and 3010. In some embodiments, thesecond dies 3008 are bonded to the first die 3002 with a direct bondingtechnique. For example, in some embodiments, the second dies 3008 havethe second RDLs 3012 bonded to the first RDL 3006 using anoxide-to-oxide bond. In other embodiments, the second dies 3008 arebonded to the first die 3002 with an adhesive, using a hybrid bondingtechnique, or another bonding technique.

While the embodiments illustrated herein show two second dies 3008 beingbonded to a single first die 3002, the embodiments are intended to beillustrative, and are not limiting. For example, in other embodiments, asingle second die 3008 is bonded to a single first die 3002, or tomultiple first dies 3002. Additionally, the second dies 3008 areillustrated as being narrower than the first die 3002, leaving a spaceabove the first RDL 3006 uncovered by any of the second dies 3008.However, the widths and arrangements of the second dies 3008 withrespect to the first die 3002 are shown in order to illustrate a fan-outarrangement, and are not intended to be limiting.

A first molding compound 3016 is formed over the first die 3002 andsecond dies 3008. In an embodiment, the first molding compound 3016 isformed as described above with respect to FIG. 3, 16 or 21. In someembodiments, the molding compound 3016 extends over the second die 3008and fills the region between the second dies 3008 and the regionadjacent to the second dies over the first die 3002. In otherembodiments, the first molding compound 3016 is planarized to be aboutlevel or planar with the top surfaces of the second substrate 3010.

FIG. 31 illustrates a cross-sectional view of forming of first vias 3102through the second dies 3008 to the first RDL 3006 and second RDLs 3012according to some embodiments. Multiple ones of the individual firstvias 3102A . . . 3102F are referred to collectively as the first vias3102 for convenience. The first vias 3102 are illustrated here as beingformed by the dual damascene via last technique, as illustrated in FIGS.21-29, however another via last technique can be used to form the vias3102. For example, in some embodiments, the first vias 3102 are formedwith full spacers according to the embodiments described in FIGS. 1through 15, or with partial height spacers according to the embodimentsdescribed in FIGS. 16 through 20.

First vias 3102 are formed through the second dies 3008 to conductiveelements 3014 in the RDLs 3006 and 3012, which electrically connect thefirst vias 3102 to the first substrate 3004 or the second substrates3010. In some embodiments, a first via 3102 connects the first substrate3004 to one of the second substrates 3010. For example, first via 3102Dconnects to both a conductive element 3104 in the one of the second RDLs3012 and to a conductive element 3014 in the first RDL 3006, providinginterchip connectivity between the first die 3002 and the second die3008. Additionally, in some embodiments, a first via 3102F extendsthrough the first molding compound 3016 adjacent to the second dies 3008to a conductive element 3014 in the first RDL 3006. In some embodiments,a first via 3102E has a portion extending laterally through the firstmolding compound 3016 in a fan-out configuration.

FIG. 32 illustrates a cross-sectional view of mounting a third die 3202on the package 3000 according to some embodiments. The third die 3202has a third substrate 3204 and a third RDL 3206 and is mounted over thesecond dies 3008. The third RDL 3206 has one or more conductive features3104 connected to the third substrate 3204. In embodiments where thefirst molding compound 3016 extends over the second dies 3008, the thirddie 3202 is mounted on the top surface of the first molding compound3016, and in embodiments where the second dies 3008 are exposed throughthe first molding compound 3016, the third die 3202 is mounted on thesecond dies 3008 and the top surface of the first molding compound 3016.The third die 3202 is mounted to the package with a die attachment film(DAF), an adhesive, with direct surface bonding or anther process. Asecond molding compound 3208 is formed around the third die 3202, and insome embodiments is formed as described above for the first moldingcompound 3106. In other embodiments, the second molding compound 3208 isformed around the third die 3202 prior to mounting the third die 3202 tothe package 3000.

The third die 3202 is illustrated as being mounted directly on the topsurface of the first molding compound 3106; however, the embodiments arenot limited to such a structure. In other embodiments, one or moreintermediate layers (not shown) are formed over the package 3000 priorto mounting the third die 3202. For example, a dielectric layer,protective layer, passivation layer, or another layer are formed overthe first molding compound 3016 or second dies 3008, with the third die3202 mounted to the intermediate layers.

FIG. 33 illustrates a cross-sectional view of forming second vias 3302through the third die 3202 and second molding compound 3208 according tosome embodiments. Multiple ones of the individual second vias 3302A . .. 3302G are referred to collectively as the second vias 3302 forconvenience. Similar to the first vias 3102, the second vias 3302 areillustrated here as being formed by the dual damascene via lasttechnique, but in other embodiments, are formed with a full heightspacer or partial height spacer technique. Additionally, while the firstvias 3102 and second vias 3302 are shown as being formed using the sametechnique, the different layers of vias are formed, in some embodiments,using different via formation techniques.

In some embodiments, one or more of the second vias 3302 extend throughthe third substrate 3204 to contact conductive elements 3104 in thethird RDL 3206. For example, second vias 3302D and 3302E extend toconductive elements 3104 in the third RDL 3206 to provide, for example,power or communication connectivity between the third substrate 3204 anda subsequently formed external connector. In such an example, the secondvias 3302D and 3302E terminate within the third RDL 3206 and areinsulated from the first molding compound 3016. This permits a first via3102 to be under a second via 3302 without contacting the second via3302. For example, first via 3102D provides interchip connectivitybetween the first die 3002 and a second die 3008, but does not requireconnectivity to an external connector, and can be aligned under a secondvia 3302D that terminates in the third RDL 3206. Thus, first via 3102Dis electrically insulated from the second vias 3302. In another example,a first via 3102E extends laterally from underneath a second via 3302Ethat terminates in the third RDL 3206. A different second via 3302, suchas second via 3302F, provides connectivity between the first via 3102Eand a subsequently formed external connector.

Additionally, in some embodiments, one or more of the second vias 3302extend through the third RDL 3206 to contact the top surfaces of thefirst vias 3102. For example, second via 3302B extends through the thirdRDL 3206 and contacts the top surface of first via 3102B to provide, forexample, power or communication connectivity between the first substrate3004 and a subsequently formed external connector.

In some embodiments, one or more of the second vias 3302 contact aconductive element 3104 in the third RDL 3206 and a first via 3102.Thus, communication connectivity can be provided between the thirdsubstrate 3204 and the first substrate 3004 or the second substrate3010. For example, second via 3302A contacts a conductive element 3104in the third RDL 3206 and extends through the conductive element 3104 tocontact first via 3102A. The first via 3102A contacts a conductiveelement 3104 in the second RDL 3012 that is in turn connected to thesecond substrate 3010. Similarly, second via 3302C contacts a conductiveelement 3104 in the third RDL 3206, and extends through the conductiveelement 3104 to contact first via 3102C. The first via 3102C contacts aconductive element 3104 in the first RDL 3006 that is in turn connectedto the first substrate 3004. Thus, interchip connections are providedbetween the third substrate 3204 and either the first substrate 3004 orthe second substrate 3010 by way of the first vias 3102 and second vias3302.

In some embodiments, the first die 3002 is wider than the third die3202. In such embodiments, a portion of the second molding compound 3208is disposed over the first molding compound 3016 adjacent to the thirddie 3202. Second vias 3302 are formed through the portion of the secondmolding compound 3208 that is adjacent to the third die 3202. Forexample, in some embodiments, a second via 3302G extends through thesecond molding compound 3208 to contact the top surface of a standard orvertical first via 3102F that extends into the first RDL 3006 andcontacts a conductive element 3104. In another example, a second via3302F extends through the second molding compound 3208 to contact thetop surface of the portion of first via 3102E that extends laterallythrough the first molding compound 3016 in a fan-out configuration.Thus, power or data connectivity can be provided to the first die orsecond die 3008 without the second via 3102 passing through the thirddie 3202. Such an arrangement is used, for example, where the third die3202 is narrower than the first die 3002.

Additionally, while the third die 3202 is illustrated herein as havingthe same width as the second dies 3008, the second dies 3008, in someembodiments, extend past the edges of the third die 3202. In such anembodiment, the second vias 3302 are disposed directly over the seconddies 3008. The second vias 3302 extend through the second moldingcompound 3208 to contact the first vias 3102 that extend verticallythrough the second dies 3008. Alternatively, in other embodiments, thethird die 3202 is wider than the second dies 3008, and extends past theedge of the second die 3008. In such embodiments one or more second vias3302 are disposed laterally adjacent to, or outside the edges of, thesecond dies 3008 and extend through the third die 3202 to contact afirst via 3102 that extends through a portion of the first moldingcompound 3016 that is adjacent to the second dies 3008. Additionally, insome embodiments, a fan-in arrangement is used, with each of the firstvias 3102 and second vias 3302 extending through a substrate. In such anembodiment, the first, die 3002, second dies 3008 and third die 3202have edges that substantially align, with vias 3102F/3302G or 3302Fbeing eliminated.

While the package 3000 illustrated herein shows three layers of dies,the package 3000 is not limited to such embodiments. In otherembodiments, one or more additional layers are formed over the third die3202, with additional vias extending through each of the layers tocontact vias in the underlying layers. Furthermore, in some embodiments,vias are formed through both the top and bottom side of the package3000. In such embodiments, additional layers, with additional dies, areformed on both sides of the package.

FIG. 34 illustrates a cross-sectional view of forming a top RDL 3402over the second molding compound 3208 according to some embodiments. Insome embodiments, the top RDL 3402, protective layer 3406 and connectors3408 are formed using a process similar to those described above withrespect to FIGS. 12-15. The top RDL 3402 has top RDL dielectric layers3404 with one or more top RDL conductive elements 3410 connecting one ormore of the second vias 3302 to the connectors 3408. The protectivelayer 3406 is disposed over the top RDL 3402, with the connectors 3408extending through openings in the protective layer 3406 to contact thetop RDL conductive elements 3410. The connectors 3408 are electricallyconnected to the second vias 3302, providing power or data connectivityto the first die 3002, as with via pairs 3302B/3102B or 3102F/3302G, tothe second dies 3008, as with via pairs 3102E/3302F, or to the third die3202, as with vias 3302D or 3302E.

In some embodiments, second vias 3302 that provide interchipconnectivity between the third die 3202 and the first die 3002 or seconddies 3008 are electrically insulated from the connectors 3408, whilesecond vias 3302 providing power or data connectivity to the dies 3002,3008 or 3202 are electrically connected to the connectors 3408. Forexample, second via 3302A contacts a conductive element 3104 in thethird RDL 3206 and first via 3102A. First via 3102, in turn, contacts aconductive element 3104 in the second RDL 3012. Thus, interchipconnectivity is provided between the third die 3202 and the second die3008 by way of second via 3302A and first via 3102A. In such an example,the second via 3302 is not connected to a connector 3408 and iselectrically insulated at a top surface by the top RDL dielectric layers3404.

With some of the second vias 3302 being insulated from the connectors3408, no top RDL conductive element 3410 is required over, or connectingto, some of the second vias 3302. Thus, the pitch or arrangement of theconnectors 3408 is, in some embodiments, different than the pitch orarrangement of the second vias 3302. Additionally, some of the top RDLconductive elements 3410 extend laterally over the second vias 3302 thatare insulated from the connectors 3408.

FIG. 35 illustrates a cross-sectional view of mounting the package 3000on a second package 3502 according to some embodiments. The package 3000is mounted by way of the connectors 3408 to the second package 3502,which may be a substrate, a die, a PCB, a chip, or another surface. Insome embodiments, the second package 3502 has one or more secondconnectors 3504 opposite the connectors 3408. Additionally, on someembodiments, a heat dissipating structure such as a heat sink 3506 isattached to the package 3000 by an adhesive layer 3508 or by anotherbonding material or thermal adhesive. Additionally, while not shown,additional dies are, in some embodiments, mounted on the second package3502 and are in electrical communication with the package 3000 throughthe second package.

Thus, a package according to an embodiment comprises a first die havinga first redistribution layer (RDL) disposed on a first side of a firstsubstrate and a second die having a second RDL disposed on a first sideof a second substrate. The first RDL is bonded to the second RDL. Athird die has a third RDL disposed on a first side of a third substrate.The third die is mounted over the second die, the second die disposedbetween the first die and the third die. First vias extend through, andare electrically isolated from, the second substrate, with the firstvias each contacting a conductive element in the first RDL or the secondRDL. Second vias extend through, and are electrically isolated from, thethird substrate, with the second vias each contacting a conductiveelement in the third RDL or one of the first vias.

According to another embodiment, a package comprises a first die havinga first redistribution layer (RDL) disposed on a first substrate and asecond die having a second RDL disposed on a second substrate. Thesecond die is disposed over the first die with the second RDL bonded tothe first RDL. A first molding compound is disposed over the first dieand around the second die. A third die has a third RDL disposed on athird substrate, with the third die disposed over the first moldingcompound. A second molding compound is disposed over the first moldingcompound and around the third die. First vias extend through the secondsubstrate and each contact at least one conductive element in the firstRDL or the second RDL. First spacers electrically insulate the firstvias from the second substrate. Second vias extend through the thirdsubstrate and each contact a conductive element in the third RDL or oneof the first vias. Second spacers electrically insulate the second viasfrom the third substrate.

A method according to an embodiment comprises providing a first diehaving a first redistribution layer (RDL) disposed on a first substrate,with the first RDL comprising a first oxide layer and providing a seconddie having a second RDL disposed on a second substrate, with the secondRDL comprising a second oxide layer. The first die is bonded to thesecond die by bonding the first oxide layer to the second oxide layerwith an oxide-to-oxide bond. First openings are formed in the second dieafter the bonding the first die to the second die. The first openingsextend through the second substrate and expose first conductive elementsin the first RDL or the second RDL. First vias are formed in the firstopenings, with the first vias extending through the second substrate andeach contacting a respective one of the first conductive elements. Thefirst vias are electrically insulated from the second substrate. A thirddie is mounted over the second die, with the third die having a thirdRDL disposed on a third substrate. Second openings in the third dieafter the mounting the third die over the second die. The secondopenings each extend through the third substrate and expose one of thefirst vias or a second conductive element in the third RDL. Second viasare formed in the second openings, with the second vias extendingthrough the third substrate and contacting a respective one of thesecond conductive elements or one of the first vias. The second vias areelectrically insulated from the third substrate.

In accordance with an embodiment, a method includes bonding a first dieto a second die by directly bonding a first oxide layer of the first dieto a second oxide layer of the second die with an oxide-to-oxide bond,the first die comprises a first semiconductor substrate and the seconddie comprises a second semiconductor substrate; forming a first openingin the second die after the bonding the first die to the second die,wherein the first opening extends through the second semiconductorsubstrate and exposes a first conductive element of the first die or thesecond die; forming a first via in the first opening, the first via iselectrically insulated from the second semiconductor substrate by afirst spacer; mounting a third die over the second die, the third diehaving a third semiconductor substrate; forming a second opening in thethird die after the mounting the third die over the second die, thesecond opening extending through the third semiconductor substrate andexposing the first via; and forming a second via in the second opening,the second via is electrically insulated from the third semiconductorsubstrate by a second spacer.

In accordance with an embodiment, a method includes bonding firstsemiconductor die to a second semiconductor die using a directoxide-to-oxide bond; forming an insulating material over a first one ofthe first semiconductor die and the second semiconductor die, theinsulating material at least laterally encapsulating a second one of thefirst semiconductor die and the second semiconductor die; patterning afirst opening extending through a first semiconductor substrate of thefirst semiconductor die; forming a first spacer along a first sidewallof the first opening; and forming a conductive via in the first opening,the first spacer electrically insulates the conductive via from thefirst semiconductor substrate.

In accordance with an embodiment, a method includes bonding firstsemiconductor die to a second semiconductor die, the first semiconductordie comprising a first semiconductor substrate, and the secondsemiconductor die comprising a second semiconductor substrate; forming afirst insulating material over the first semiconductor die and aroundthe second semiconductor die; patterning a first opening extendingthrough the second semiconductor substrate and a portion of the firstinsulating material over the second semiconductor substrate; forming afirst spacer along a first sidewall of the first opening; and forming afirst conductive via in the first opening, the first spacer electricallyinsulates the first conductive via from the second semiconductorsubstrate.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A method, comprising: bonding a first die to asecond die by directly bonding a first oxide layer of the first die to asecond oxide layer of the second die with an oxide-to-oxide bond, thefirst die comprises a first semiconductor substrate and the second diecomprises a second semiconductor substrate; forming a first opening inthe second die after the bonding the first die to the second die,wherein the first opening extends through the second semiconductorsubstrate and exposes a first conductive element of the first die or thesecond die; forming a first via in the first opening, the first via iselectrically insulated from the second semiconductor substrate by afirst spacer; mounting a third die over the second die, the third diehaving a third semiconductor substrate; forming a second opening in thethird die after the mounting the third die over the second die, thesecond opening extending through the third semiconductor substrate andexposing the first via; and forming a second via in the second opening,the second via is electrically insulated from the third semiconductorsubstrate by a second spacer.
 2. The method of claim 1, furthercomprising: forming a first molding compound over the first die andaround the second die prior to the forming the first via; and forming asecond molding compound around the third die prior to the forming thesecond via.
 3. The method of claim 2, wherein the first molding compoundis disposed between the second die and the third die along a directionperpendicular to a major surface of the second semiconductor substrate.4. The method of claim 2, further comprising: forming a third viaextending through the first molding compound adjacent the second dieprior to the mounting the third die, wherein the third via extendsthrough the first molding compound and contacts a second conductiveelement of the first die.
 5. The method of claim 4, further comprisingforming a fourth via through the second molding compound, wherein thefourth via contacts at least one of the first via or the third via. 6.The method of claim 1, further comprising: prior to forming the firstvia, depositing a spacer layer along sidewalls and a bottom surface ofthe first opening; and etching the spacer layer to remove lateralportions of the spacer layer and define the first spacer.
 7. The methodof claim 1, wherein the first conductive element is disposed in thefirst die, and wherein the first opening further exposes a thirdconductive element of the second die over the first conductive element.8. The method of claim 1, wherein the third conductive element acts asan etch stop layer during forming the first opening.
 9. A methodcomprising: bonding first semiconductor die to a second semiconductordie using a direct oxide-to-oxide bond; forming an insulating materialover a first one of the first semiconductor die and the secondsemiconductor die, the insulating material at least laterallyencapsulating a second one of the first semiconductor die and the secondsemiconductor die; patterning a first opening extending through a firstsemiconductor substrate of the first semiconductor die; forming a firstspacer along a first sidewall of the first opening; and forming aconductive via in the first opening, the first spacer electricallyinsulates the conductive via from the first semiconductor substrate. 10.The method of claim 9, wherein the insulating material comprises amolding compound.
 11. The method of claim 9, wherein a width of thefirst one of the first semiconductor die and the second semiconductordie has a different width than the second one of the first semiconductordie and the second semiconductor die.
 12. The method of claim 9, furthercomprising planarizing the insulating material so that a lateral surfaceof the insulating material is substantially level with a lateral surfaceof the second one of the first semiconductor die and the secondsemiconductor die.
 13. The method of claim 9, wherein forming theinsulating material further comprises forming the insulating materialover the second one of the first semiconductor die and the secondsemiconductor die, and wherein patterning the first opening furthercomprises patterning the first opening through at least a portion of theinsulating material.
 14. The method of claim 9, further comprisingforming redistribution layers over the first semiconductor die and thesecond semiconductor die, wherein the redistribution layers areelectrically connected to the conductive via.
 15. The method of claim 9,wherein patterning the first opening comprises exposing a firstconductive feature in the second semiconductor die.
 16. The method ofclaim 9, wherein patterning the first opening further comprises exposinga second conductive feature in the first semiconductor die.
 17. A methodcomprising: bonding first semiconductor die to a second semiconductordie, the first semiconductor die comprising a first semiconductorsubstrate, and the second semiconductor die comprising a secondsemiconductor substrate; forming a first insulating material over thefirst semiconductor die and around the second semiconductor die;patterning a first opening extending through the second semiconductorsubstrate and a portion of the first insulating material over the secondsemiconductor substrate; forming a first spacer along a first sidewallof the first opening; and forming a first conductive via in the firstopening, the first spacer electrically insulates the first conductivevia from the second semiconductor substrate.
 18. The method of claim 17,wherein a first portion of the first conductive via in the portion ofthe first insulating material over the second semiconductor substrate iswider than a second portion of the first conductive via in the secondsemiconductor substrate.
 19. The method of claim 17 further comprising:disposing a third semiconductor die over the second semiconductor die,the third semiconductor die comprising a third semiconductor substrate;encapsulating the third semiconductor die in a second insulatingmaterial disposed over the first insulating material; patterning asecond opening extending through at least a portion of the secondinsulating material; and forming a second conductive via in the secondopening, the second conductive via contacting the first conductive via.20. The method of claim 19, wherein the second conductive via islaterally spaced apart from the second semiconductor die, and whereinthe first conductive via has a fan-out configuration extending laterallypast a sidewall of the second semiconductor die.